In 2005, PFOS was proposed for listing under the Stockholm Convention and added to Annex B four years later, in May 2009. The amendment entered into force on 26 August 2010 for all Parties that had not submitted a notification pursuant to the provisions of paragraph 3(b) of Article 22. PFOS was and is still used for many applications due to its outstanding surface properties, such as lowering surface tension. Due to this physical property, PFOS-based chemicals are used in the semiconductor industry for the manufacture of imaging devices such as digital cameras, cell phones, printers, scanners, etc. The amount of PFOS needed for production has already been significantly reduced, entailing a reduction in releases to the environment and related risks. But there is still the need to use it for some applications of the semiconductor production, so research is ongoing to further reduce the need for PFOS in this industry.